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International Journal of Extreme Manufacturing, Volume. 5, Issue 1, 12006(2023)

Atomic layer deposition for nanoscale oxide semiconductor thin film transistors: review and outlook

[in Chinese]... [in Chinese], [in Chinese], [in Chinese] and [in Chinese]* |Show fewer author(s)
Author Affiliations
  • Division of Materials Science and Engineering, Hanyang University, 222 Wangsimni-ro, Seongdong-gu, Seoul 04763, Republic of Korea
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    [in Chinese], [in Chinese], [in Chinese], [in Chinese], [in Chinese]. Atomic layer deposition for nanoscale oxide semiconductor thin film transistors: review and outlook[J]. International Journal of Extreme Manufacturing, 2023, 5(1): 12006

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    Paper Information

    Category: Topical Review

    Received: Oct. 10, 2022

    Accepted: --

    Published Online: Jul. 26, 2024

    The Author Email: (jsparklime@hanyang.ac.kr)

    DOI:10.1088/2631-7990/acb46d

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology