Acta Physica Sinica, Volume. 68, Issue 4, 048501-1(2019)

Temperature dependence of single-event transient response in devices with selective-buried-oxide structure

Zhan-Zhan Gao1... Peng-Fei Hou1,*, Hong-Xia Guo1,2, Bo Li1, Hong-Jia Song1, Jin-Bin Wang1 and Xiang-Li Zhong1,* |Show fewer author(s)
Author Affiliations
  • 1Department of Material Science and Engineer, Xiangtan University, Xiangtan 411105, China
  • 2Northwest Institute of Nuclear Technology, Xi’an 710024, China
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    Figures & Tables(10)
    Device physical models: (a) The whole structure of devices; (b) the cross section of SELBOX SOI device; (c) the cross section of floating-body device.器件物理模型 (a) 器件整体模型; (b) SELBOX SOI器件有源区截面; (c) 浮体器件有源区截面
    Three-level inverter chains.三级反相器链
    Single-event-transient pulse of SOI NMOS and output 3 at room temperature: (a) Current pulse; (b) voltage pulse.室温下SOI NMOS及输出节点3的单粒子瞬态脉冲 (a) 瞬态电流脉冲; (b) 瞬态电压脉冲
    Single-event-transient pulse of SOI PMOS and output 3 at room temperature: (a) The current pulse; (b) the voltage pulse.室温下SOI PMOS及输出节点3的单粒子瞬态脉冲 (a) 瞬态电流脉冲; (b) 瞬态电压脉冲
    The pulsewidth of SOI NMOS and output 3 at different temperatures: (a) Changes of the current pulsewidth; (b) changes of the voltage pulsewidth.SOI NMOS及输出节点3的脉冲宽度随温度的变化 (a) 瞬态电流脉冲宽度的变化; (b) 瞬态电压脉冲宽度的变化
    The pulsewidth of SOI PMOS and output 3 at different temperatures: (a) Changes of the current pulsewidth; (b) changes of the voltage pulsewidth.SOI PMOS及输出节点3的脉冲宽度随温度的变化 (a) 瞬态电流脉冲宽度的变化; (b) 瞬态电压脉冲宽度的变化
    The charge collection of SOI NMOS at different temperatures: (a) Floating-body device; (b) SELBOX SOI device.在不同温度下SOI NMOS的电荷收集量 (a) 浮体器件; (b) SELBOX SOI器件
    The charge collection of SOI PMOS at different temperatures: (a) Floating-body device; (b) SELBOX SOI device.在不同温度下SOI PMOS的电荷收集量 (a) 浮体器件; (b) SELBOX SOI器件
    The bipolar amplification effect of SOI devices: (a) Floating-body device; (b) SELBOX SOI device.SOI器件产生双极放大的原理 (a) 浮体器件; (b) SELBOX SOI器件
    • Table 1. Technologic parameters of SOI devices.

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      Table 1. Technologic parameters of SOI devices.

      参数数值
      多晶硅厚度/ $ {\text{μ}}{\rm m}$0.15
      栅氧层厚度/nm1.4
      埋氧层厚度/ $ {\text{μ}}{\rm m}$0.16
      埋氧层镂空宽度/ $ {\text{μ}}{\rm m}$0.09
      N型衬底浓度/cm–31×1016
      N阱/P阱浓度/cm–35×1017
      源/漏浓度/cm–32×1020
      源/漏轻掺杂 (LDD) 浓度/cm–31×1019
      阈值电压掺杂浓度/cm–37.6×1018
      冠状 (Halo) 掺杂浓度/cm–32×1018
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    Zhan-Zhan Gao, Peng-Fei Hou, Hong-Xia Guo, Bo Li, Hong-Jia Song, Jin-Bin Wang, Xiang-Li Zhong. Temperature dependence of single-event transient response in devices with selective-buried-oxide structure[J]. Acta Physica Sinica, 2019, 68(4): 048501-1

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    Paper Information

    Received: Oct. 30, 2018

    Accepted: --

    Published Online: Sep. 16, 2020

    The Author Email: Zhong Xiang-Li (xlzhong@xtu.edu.cn)

    DOI:10.7498/aps.68.20191932

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