Femtosecond-Laser-Induced All-Silicon Dielectric Metasurfaces Assisted by Wet Chemical Etching

Ioanna Sakellari; Sotiris Droulias; Andreas Lemonis; Emmanuel I. Stratakis

doi:10.34133/ultrafastscience.0019

Ultrafast Science, Volume. 3, Issue 1, 0019(2023)

Femtosecond-Laser-Induced All-Silicon Dielectric Metasurfaces Assisted by Wet Chemical Etching

Ioanna Sakellari^1、*, Sotiris Droulias², Andreas Lemonis³, and Emmanuel I. Stratakis^1、*

¹Institute of Electronic Structure and Laser, Foundation for Research and Technology Hellas, Heraklion, Crete, 71110, Greece.

²University of Piraeus, Piraeus, 18534, Greece.

³Biomimetic, Science and Technology Park of Crete, Heraklion, Crete, 70013, Greece.

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Ioanna Sakellari, Sotiris Droulias, Andreas Lemonis, Emmanuel I. Stratakis. Femtosecond-Laser-Induced All-Silicon Dielectric Metasurfaces Assisted by Wet Chemical Etching[J]. Ultrafast Science, 2023, 3(1): 0019

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Paper Information

Category: Research Articles

Received: Nov. 20, 2022

Accepted: Jan. 20, 2023

Published Online: Dec. 4, 2023

The Author Email: Sakellari Ioanna (stratak@iesl.forth.gr), Stratakis Emmanuel I. (isakel@iesl.forth.gr)

DOI:10.34133/ultrafastscience.0019

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology