Optics and Precision Engineering, Volume. 23, Issue 8, 2143(2015)

Automatic balancing of wavefront aberrations in high-numerical aperture lithographic lenses

XU Ming-fei1,2、* and HUANG Wei1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    References(11)

    [1] [1] MA B, LI L, HUANG Y F, CHANG J, et al.. Application and influence of aspheric surfaces in lithographic objectives design [J]. SPIE, 2010, 7657: 76570A.

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    [5] [5] WILLI U, HANS J R, RUSS H. Development of dioptric projection lenses for deep ultraviolet lithography at Carl Zeiss [J]. J. Micro/Nanolith. MEMS MOEMS, 2004,3(1): 87-96.

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    [8] [8] CHENG D, WANG Y T, HUA H. Automatic image performance balancing in lens optimization [J]. Optics Express, 2010,18(11): 11574-11588.

    [9] [9] SUN J M, LIANG Y CH. Optimal Design of Machine [D]. Beijing: China Machine Press, 2006. (in Chinese)

    [10] [10] EPPLE A. High aperture catadioptric projection objective [P]. World Intellectual Property Organization, 2009040011A2, 2009.

    [11] [11] MASAKI I, LEO G, GROOT G. Automated control of manufacturing sensitivity during optimization [J]. SPIE, 2004,5249: 343-352.

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    [1] ZHANG Jin-kai, CHEN Xiao-bo, SHAO Hai-yan, WANG Xiao-hui, SUN Xuan. Zoom lens design using mixed lens modules[J]. Optics and Precision Engineering, 2018, 26(1): 38

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    XU Ming-fei, HUANG Wei. Automatic balancing of wavefront aberrations in high-numerical aperture lithographic lenses[J]. Optics and Precision Engineering, 2015, 23(8): 2143

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    Paper Information

    Received: Oct. 9, 2014

    Accepted: --

    Published Online: Oct. 22, 2015

    The Author Email: Ming-fei XU (stone870914@163.com)

    DOI:10.3788/ope.20152308.2143

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