Acta Photonica Sinica, Volume. 42, Issue 5, 515(2013)
Femtosecond Laser Multibeam Interference Lithography Antireflective Microstructure on Silicon Surface
In order to obtain uniform distribution silicon surface microstructure, a new method was proposed based on multibeam interference lithography to relaise the controlling of the distribution character of the microstructure. Femtosecond laser multibeam interference was formed by Spatial Light Modulator (SLM), and the uniform distribution multispots with the controllable period were generated. By using these multispots, the regular distribution concave structures were fabricated on silicon surface, and the distribution character and period was flexiblly controlled by shift the phase masks on SLM. The morphology and optical character of the microstructure were measured with Scanning Electron Microscopy (SEM) and spectrophotometer. Experimental results show that the closepacked concave structure with the period of about 3.3 μm can be fabricated on the silicon surface under special parameters (10× focusing lens, laser power of 25 mW, exposing time of 30 s) by loading the phase of 4facet pyramid lens with the base angle of 2°; the formed structure shows good effect of antireflection; its transmission at the near infrared band of 1.2~2 μm enhances 11.5% in comparison with the polished silicon.
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HE Fengtao, ZHOU Qiang, YANG Wenzheng, LONG Xuewen, BAI Jing, CHENG Guanghua. Femtosecond Laser Multibeam Interference Lithography Antireflective Microstructure on Silicon Surface[J]. Acta Photonica Sinica, 2013, 42(5): 515
Received: Dec. 14, 2012
Accepted: --
Published Online: May. 22, 2013
The Author Email: Fengtao HE (hefengtao@xupt.edu.cn)