Fig. 1. Schematic diagram of sputtering system

Fig. 2. Magnetic field strength and film thickness distribution

Fig. 3. Magnetic field strength and film thickness distribution

Fig. 4. Test piece motion track

Fig. 5. Comparison of the uniformity of SiO₂ and Nb₂O₅ monolayers with or without metric-spin system

Fig. 6. Schematic of measuring points

Fig. 7. Schematic of base plate clamp and shielding angle

Fig. 8. Uniformity distribution of film thickness of SiO₂ and Nb₂O₅ under different shielding angles

Fig. 9. IR cut filter design curve

Fig. 10. Comparison between the measured spectral curve and the designed curve