Acta Photonica Sinica, Volume. 43, Issue 4, 422005(2014)

Design and Analysis of a Precision Axial Adjusting Mechanism for Optical Elements in Lithographic Lens

PENG Hai-feng* and SUN Zhen
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  • [in Chinese]
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    References(14)

    [1] [1] FAY B. Advanced optical lithography development, from UV to EUV[J]. Microelectronic Engineering, 2002, 61-62: 11-24.

    [2] [2] XU Wei-cai, HUANG Wei, YANG Wang. Magnification tolercing and compensation for the lithographic projection lens[J]. Acta Optica Sinica, 2011, 31(11): 952-955.

    [3] [3] PAROS J M, WEISBORD L. How to design flexure hinges[J]. Machine Design, 1965, 37(27): 151-156.

    [7] [7] DUAN Xue-ting, ZHOU Ren-kui, Wu Meng-yuan, et al. Distortion alignment method for center shaft supporting large aperture mirror[J]. Acta Photonica Sinica, 2011, 40(12): 95-98.

    [9] [9] ZHANG Jing-zhu, XU Cheng, ZHAO Yan-jun. Compiance calculation of a novel flexure hinge[J]. Engineering Mechanics, 2008, 25(11): 27-32.

    [14] [14] NI Ming-yang, GONG Yan. Transmission ratio analysis for a lateral adjustment barrel in DUV projection lens[J]. Infrared and Laser Engineering, 2012, 41(12): 3323-3330.

    CLP Journals

    [1] ZHANG De-fu, LI Xian-ling, DONG Li-jian, SUN Zhen. Coupling Error Inhibition of Eccentric Adjustment Mechanism Design in Lithographic Objective Lens[J]. Acta Photonica Sinica, 2015, 44(9): 922001

    [2] LI Mei-xuan, WANG Li, DONG Lian-he. Design of Aspherical Zoom Optical System in Immersion Lithography Lighting System[J]. Acta Photonica Sinica, 2018, 47(1): 122002

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    PENG Hai-feng, SUN Zhen. Design and Analysis of a Precision Axial Adjusting Mechanism for Optical Elements in Lithographic Lens[J]. Acta Photonica Sinica, 2014, 43(4): 422005

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    Paper Information

    Received: Jul. 31, 2013

    Accepted: --

    Published Online: May. 4, 2014

    The Author Email: Hai-feng PENG (kedapeng1986@163.com)

    DOI:10.3788/gzxb20144304.0422005

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