Opto-Electronic Engineering, Volume. 49, Issue 2, 210333-1(2022)
Research progress of laser-assisted chemical vapor deposition
Lisha Fan1,2,3, Fan Liu1,2,3, Guolong Wu1,2,3, S. Kovalenko Volodymyr1,2,3,4, and Jianhua Yao1,2,3、*
Author Affiliations
1Institute of Laser Advanced Manufacturing, Zhejiang University of Technology, Hangzhou, Zhejiang 310023, China2College of Mechanical Engineering, Zhejiang University of Technology, Hangzhou, Zhejiang 310023, China3Collaborative Innovation Center of High-End Laser Manufacturing Equipment (National 2011 Plan), Zhejiang University of Technology, Hangzhou, Zhejiang 310023, China4Laser Technology Research Institute, National Technical University of Ukraine, Kiev 03056, Ukraineshow less
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Laser chemical vapor deposition (LCVD) technology has its unique advantages in reducing deposition temperatures, enhancing film purity and directly writing complex thin film patterns compared with conventional chemical vapor deposition (CVD). This technology has been widely applied in thin film deposition and attracted growing attention from both research and industries. This review categorizes the LCVD technology into three types according to the laser-matter interaction mechanisms, including laser pyrolysis, laser photolysis, and laser resonance excitation sensitization. We illustrate the deposition principles governed by the three different mechanisms in detail, and briefly introduce the commonly used equipment, and summarize the latest research progress of LCVD technology in synthesis and applications of metals, carbon-based materials, oxides and semiconductors. The detection and analysis methods used in LCVD are specially introduced, and the challenges and prospects of LCVD in material synthesis are discussed.
