[1] [1] CUI Zheng.Micro-nanofabrication technologies and applications［M］.Beijing:Higher Education Press,2005,1-86.

[2] [2] ZHAO Wei-liu,QI Huo-wei, ZHANG Xiang.Surface plasmon interference nanolithography［J］. Nano Letters,2005,5(5):957-961.

[3] [3] LEI Ming,YAO Bao-li.Theoretical and experimental studies on multi-beam interference by using pyramid lens［J］.Acta Optica Sinica,2006,26(5):757-762.

[4] [4] YANG Yi,ZHANG Su-huai,WANG Guo-ping.Fabrication of two-dimensional metallodielectric quasicrystals by single-beam holography［J］.Appl Phys Lett,2006,88:251104.

[5] [5] ZHANG Jin,FENG Bo-ru,GUO Yong-kang,et al.Laser interference photolithography for fabricating periodic patterns in large area［J］.Opto-Elec Engineering,2001,28(6):20-23.

[6] [6] LUO Xian-gang,ISHIHARA T. Surface plasmon resonant interference nanolithography technique［J］. Applied Physics Letters,2004,84(23):4780-4782.

[7] [7] GUO X,DU J,GUO Y.Large-area surface-plasmon polariton interference［J］.Opt Lett,2006,17(31):2613-2615.

[8] [8] ZHAO Hua-wei,HUANG Xu-guang,SU Hui.A novel Y- branch waveguide based on surface plasmon polaritions［J］.Acta Optica Sinica,2007,27(9):1649-1652.

[9] [9] FANG Liang,DU Jing-lei.Study on SPPs interference lithography based on ATR coupling［D］.Chengdu:Sichuan University,2008,5-46.

[10] [10] FANG N,ZHANG X. Imaging properties of a metamaterial superlens［J］. Applied Physics Letters,2003,82(2):161-163.

[11] [11] XIAO Xiao,DU jing-lei.Study on imaging characteristics of thick photoresists in lithography［D］.Chengdu:Sichuan University,2003:9-42.