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Acta Photonica Sinica, Volume. 39, Issue 5, 792(2010)

Resist Exposure Developing Simulation Study of SPPs Lithography

ZHENG Yu1,2, WANG Jing-quan1, LI Ming1, NIU Xiao-yun1, and DU Jing-lei1
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    ZHENG Yu, WANG Jing-quan, LI Ming, NIU Xiao-yun, DU Jing-lei. Resist Exposure Developing Simulation Study of SPPs Lithography[J]. Acta Photonica Sinica, 2010, 39(5): 792

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    Paper Information

    Received: Jun. 29, 2009

    Accepted: --

    Published Online: Jul. 5, 2010

    The Author Email:

    DOI:

    CSTR:32186.14.

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology