[1] [1] ZHAO Y, GONG Y. Computer aided alignment of small scale projected objective ［J］. Chinese Optics, 2012, 5(4): 394-400. (in Chinese)

[2] [2] ZHAO L, GONG Y, ZHAO Y. Flexure-based X-Y micro-motion mechanism used in lithographic lens［J］. Opt. Precision Eng., 2013, 21(6): 1425-1433. (in Chinese)

[3] [3] ZHAO F F, TANG J Y, HUANG W, et al.. Computer-aided alignment for the lithographic lens［J］. Acta Optica Sinica, 2014, 34(6): 0622001. (in Chinese)

[4] [4] ZHU J T, SONG ZH Q, DING T, et al.. Stability of Mg/Sic, Mg/Co EUV multilayers ［J］. Opt. Precision Eng., 2013, 21(6): 1380-1386. (in Chinese)

[5] [5] TOMOYUKI M, YASUHIRO O, YOHEI F, et al.. Catadioptric projection lens for 1.3 NA scanner ［J］. SPIE, 2007, 6520: 652021.

[6] [6] KNEER B, GRUPNER P, GARREIS R, et al.. Catadioptric lens design: The breakthrough to hyper-NA optics ［J］. SPIE, 2006, 6154: 615420.

[7] [7] DIRK J. Projection exposure method, projection exposure system and projection objective: European Patent, EP09001938.1［P］.2009.

[8] [8] Alexander. High aperture catadioptric projection objective : International Patent, WO2009040011［P］. 2009.

[9] [9] DODOC A. Toward the global optimum in lithographic lens design ［J］. SPIE-OSA, 2010, 7652: 76522B.

[10] [10] SHRIBAK M, INOUE S, OLDENBOURG R. Polarization aberrations caused by differential transmission and phase shift in high numerical-aperture lenses: theory, measurement, and rectification ［J］. Opt. Eng., 2002, 41(5): 943-954.

[11] [11] SHANG H B, LIU CH L, ZHANG W, et al.. Effects and improvements of coating induced polarization aberration on lithography lens design ［J］. Acta Optica Sinica, 2015, 35(1): 0122003. (in Chinese)

[12] [12] WANG Y ZH, ZHOU J P, GONG W P. The stop aberrations and aberration vignetting of fish-eye lenses or extreme wide-angle objectives ［J］. Applied Laser, 1998, 18(5): 200-202. (in Chinese)