For the manufacture of a lithographic lens with a 45 nm node, this paper focuses on the development of high numerical aperture (NA), deep ultraviolet (DUV) immersion lithographic lenses. Firstly, an off-axis three mirror projection lithographic objective with the NA of 1.30 and a coaxial two mirror projection lithographic objective with the NA of 1.35 were designed. Two design methods and results were compared and the latter was chosen to be used final design. Then, the relationship between variable stop aperture and telecentricity under different NAs was analyzed. A scheme of dual variable curved apertures was proposed to reduce the image telecentricity of a lithographic lens. The final results show that both wavefront errors(Root Mean　Square , RMS) and distortion of the lithographic lens are less than 1 nm by using the proposed scheme. The new scheme with dual variable curved apertures makes the maximum telecentricity decreases from 5.83-17.57 mrad to 0.26-3.21 mrad when NA varies from 0.85 to 1.35. This scheme provides an advantageous theoretical guidance and basis for research and development of the lithographic lens with 45 nm node.