Laser & Optoelectronics Progress, Volume. 58, Issue 17, 1714004(2021)
Beam Pointing Stability of Extreme Ultraviolet Lithography Light Source System
[1] Zhao H Y, Zhao H W. EUV light sources for lithography[J]. Semiconductor Technology, 32, 12-16(2007).
[2] Li H, Wang D F, Zou W et al. Design of high power laser beam automatic alignment system[J]. Chinese Journal of Lasers, 40, 1002003(2013).
[4] Lin W H, Zhu J Q, Ren L et al. Advances in target alignment and beam-target coupling technologies of laser fusion facility[J]. Chinese Journal of Lasers, 47, 0400001(2020).
[5] Ren L, Zhao D F, Zhu J Q et al. Advances in target and beam alignment unit technologies of high power laser drivers[J]. Laser & Optoelectronics Progress, 51, 080001(2014).
[7] Wang Y Y. Research on beam jitter suppression in laser precision measurement[D](2019).
[8] Li Y, Wang D, Guo X Y et al. Fast and accurate laser beam automatic alignment system based on CMOS sensor[J]. Chinese Journal of Lasers, 40, 0916002(2013).
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Xinpeng Li, Deyang Yu, Qikun Pan, Ranran Zhang, Kuo Zhang, Jin Guo, Fei Chen. Beam Pointing Stability of Extreme Ultraviolet Lithography Light Source System[J]. Laser & Optoelectronics Progress, 2021, 58(17): 1714004
Category: Lasers and Laser Optics
Received: Dec. 21, 2020
Accepted: Jan. 11, 2021
Published Online: Sep. 14, 2021
The Author Email: Yu Deyang (yudeyang830@163.com)