Beam Pointing Stability of Extreme Ultraviolet Lithography Light Source System

Xinpeng Li; Deyang Yu; Qikun Pan; Ranran Zhang; Kuo Zhang; Jin Guo; Fei Chen

doi:10.3788/LOP202158.1714004

Laser & Optoelectronics Progress, Volume. 58, Issue 17, 1714004(2021)

Beam Pointing Stability of Extreme Ultraviolet Lithography Light Source System

Xinpeng Li^1,2, Deyang Yu^1、*, Qikun Pan¹, Ranran Zhang^1,2, Kuo Zhang¹, Jin Guo¹, and Fei Chen¹

¹State Key Laboratory of Laser Interaction with Matter, Changchun Institute of Optics, Fine Mechanics and Physics, Chinese Academy of Sciences, Changchun , Jilin 130033, China

²University of Chinese Academy of Sciences, Beijing 100049, China

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Figures & Tables(7)

Fig. 1. Schematic diagram of laser beam jitter. (a) $Δ y$ ; (b) $Δ θ$ ; (c) $Δ y + Δ θ$

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Fig. 2. Schematic diagram of angular deviation measurement

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Fig. 3. Schematic diagram of beam monitoring and control

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Fig. 4. Steady-state error of position before control

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Fig. 5. Steady state error of position after control. (a) 1‒102 s; (b) 255‒357 s; (c) 750‒852 s

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Fig. 6. Beam pointing stability

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Table 1. Jitter of center of mass before and after beam alignment
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Table 1. Jitter of center of mass before and after beam alignment
Alignment Before After
1‒204 s 1‒102 s 255‒357 s 750‒852 s
X axis error /μm ±3 ±1.6 ±1.4 ±1.3
Y axis error /μm ±6 ±3.1 ±2.9 ±3.4

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Xinpeng Li, Deyang Yu, Qikun Pan, Ranran Zhang, Kuo Zhang, Jin Guo, Fei Chen. Beam Pointing Stability of Extreme Ultraviolet Lithography Light Source System[J]. Laser & Optoelectronics Progress, 2021, 58(17): 1714004

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