Acta Optica Sinica, Volume. 41, Issue 5, 0522001(2021)
Optical Design of Deep Ultraviolet Laser Irradiation System for Accelerating Material Aging
[1] Lin J X, Dong L S, Fan T A et al. Fast extreme ultraviolet lithography mask near-field calculation method based on machine learning[J]. Applied Optics, 59, 2829-2838(2020).
[2] Bonakdar A, Rezaei M, Brown R L et al. Deep-UV microsphere projection lithography[J]. Optics Letters, 40, 2537-2540(2015).
[4] Levinson H J. Principles of lithography[M]. 2 nd ed. Bellingham: SPIE(2005).
[7] Zhang L C, Zhao L, Cai X K et al. -01-21(2015).
[11] Pan Y S. Laser beam shaping using aspheric optical system[D]. Dalian: Dalian University of Technology(2010).
[13] Shi G Y. Gaussian beam shaping based on aspheric cylindrical lens[D]. Tianjin: Tianjin University of Technology(2014).
[15] Zhu K J, Shi S, Chen Z G et al. Prediction of Profile Deviation during Glass Molding of Double-Aspheric Lens[J]. Journal of Engineering Science and Technology Review, 13, 50-56(2020).
[18] Sun Y B. Research of beam homogenizing technology for diode laser[D]. Beijing: University of Chinese Academy of Sciences(2019).
Get Citation
Copy Citation Text
Yang Zhao, Yang Xiang, Tingting Li. Optical Design of Deep Ultraviolet Laser Irradiation System for Accelerating Material Aging[J]. Acta Optica Sinica, 2021, 41(5): 0522001
Category: Optical Design and Fabrication
Received: Jul. 20, 2020
Accepted: Oct. 12, 2020
Published Online: Apr. 7, 2021
The Author Email: Xiang Yang (xyciom@163.com)