Acta Optica Sinica, Volume. 42, Issue 11, 1134005(2022)

Recent Progress in Nanofabrication of High Resolution X-Ray Zone Plate Lenses by Electron Beam Lithography

Yifang Chen*
Author Affiliations
  • School of Information Science and Technology, Fudan University, Shanghai 200433, China
  • show less
    Figures & Tables(21)
    Schematic diagrams of X-ray microscopes. (a) Scanning transmission X-ray microscope[2]; (b) full-field transmission X-ray microscope[3-4]
    Micrographs of all successfully fabricated critical components in X-ray microscopes by author’s team[43-47]
    Technical roadmap of focusing/imaging zone plate lenses proposed by authors’ group from 2013 to 2022
    Comparison of proximity effect correction[45]. (a) Uniform spatial distribution of charge dose without proximity effect correction (PEC), calculated by BEAMER; (b)(c) distorted outer zones in PMMA after electron beam lithography (EBL) without PEC; (d) non-uniform spatial charge dose distribution after PEC; (e)(f) resultant zones in PMMA after EBL with distortion; (g) outer zones in Au after Au electroplating
    Simulated profiles of outer zones with 100 nm resolution in 1.5 μm thick PMMA (shaded area) obtained by LAB software[45]. (a) Simulated profiles without PEC, showing unclear zones in PMMA and without reaching depth of 1.5 μm; (b) simulated profiles with PEC by adding extra zone outside outermost zone, showing all unclear zones with depth of 1.5 μm
    SEM micrographs[45]. (a) 100 nm resolution zone plate with 2 μm wide additional zone outside outmost zone for distance of 2 μm;(b)(c) uniform exposure of outermost zones
    SEM micrographs showing successfully fabricated 70 nm resolution zone plate with large aspect ratio after proximity effect correction of pattern method[45]
    Different zone shapes and zone-widths in three different regions in zone plate ( patterns in stripes are zones generated by BEAMER software)[46]
    Three different charge distributions in PMMA with 620 nm depth obtained by three different PEC methods[46]. (a) Without PEC; (b) PEC by BEAMER and TRACER; (c) local PEC in three different regions in zone plate
    Three different simulated profiles obtained by using LAB software[46] . (a) Over exposed outcome for zones in centre and in middle of zone plate without proximity effect correction; (b) significant deviations in profiles between zones and unwanted zone spread are obtained by using the commercial BEAMER and TRACER for PEC; (c) deviations in profiles between zones are after PEC by manual zone method
    Three different replicated profiles in PMMA by EBL with three different charge distortions[46]. (a1)(a2) Without PEC; (b1)(b2) PEC for whole zone plate; (c1)(c2) PEC for local PEC
    Successfully fabricated 50 nm zone plates by EBL with local PEC[46]. (a)--(c) Soft X-ray lens; (d)--(f) hard X-ray lens
    30 nm zone plate formed by DC electroplating of Au[47]. (a) EBL pattern of 30 nm zone plate; (b)(c) micro crystals formed by DC electroplating; (d) setup of DC electroplating
    Successfully fabricated 30 nm soft X-ray zone plate lens by EBL combined with pulsed Au electroplating[47]
    Fabricated Siemens Stars with 50 nm resolution and high aspect ratio by EBL and Au electroplating. (a)(b) Replicated patterns in 1.2 μm thick PMMA by EBL; (c)--(e) successfully fabricated Siemens star with 50 nm resolution and 1 μm height (aspect ratio of 20∶1)
    30 nm resolution Siemens star fabricated by EBL combined with Au electroplating (height at 30 nm wide tips is 600 nm, and aspect ratio is 20∶1)[47]
    Demonstration of 50 nm resolution imaging by soft X-ray lens[46]. (a) SEM micrograph of 50 nm resolution Siemens star fabricated by author’s team; (b)(c) imaging results of Siemens star obtained by 50 nm resolution zone plate
    Demonstration of 50 nm resolution imaging by hard X-ray lens[46]. (a) SEM micrograph of 50 nm resolution Siemens star commercially supplied; (b) 50 nm resolution imaging of Siemens star by hard X-ray zone plate; (c) enlarged area in center of image (white line is scaling bar of 200 nm)
    Photos of in-house developed scanning transmission X-ray microscope on soft X ray beamline of BL08U1-A (706 eV) in Shanghai Synchrotron Radiation Facilities (SSRFs)
    Demonstration of 30 nm resolution imaging by soft X-ray lens[47]. (a) SEM micrographs of 30 nm resolution zone plate fabricated by author’s team; (b)--(d) soft X-ray imaging photos when magnification increases from left to right, showing 30 nm line in center of each photo
    • Table 1. Existing five different X ray lenses and their performances, working modes, and application scopes

      View table

      Table 1. Existing five different X ray lenses and their performances, working modes, and application scopes

      Lens nameLens typeResolution /nmTheoreticalefficiency /%Actualefficiency /%FocusingmethodImaging method
      Zone plateRefractive1010--405--10SpotScanning/Full field
      1D-Kinoform lensDeflective5090401D lineN/A
      CRLDeflective5050--60401D lineN/A
      Laue lensReflective1050--6040SpotScanning
      KB mirrorReflective1100100SpotScanning
    Tools

    Get Citation

    Copy Citation Text

    Yifang Chen. Recent Progress in Nanofabrication of High Resolution X-Ray Zone Plate Lenses by Electron Beam Lithography[J]. Acta Optica Sinica, 2022, 42(11): 1134005

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: X-Ray Optics

    Received: Feb. 9, 2022

    Accepted: Apr. 18, 2022

    Published Online: Jun. 3, 2022

    The Author Email: Chen Yifang (yifangchen@fudan.edu.cn)

    DOI:10.3788/AOS202242.1134005

    Topics