[1] Attwood D, Sakdinawat A. X-rays and extreme ultraviolet radiation: principles and applic-ations[J]. Microscopy & Microanalysis, 15, 585-586(1999).

[2] Spielmann C, Burnett N H, Sartania S et al. Generation of coherent X-rays in the water window using 5-femtosecond laser pulses[J]. Science, 278, 661-664(1997).

[3] Walker A B, Lindblom J F, Barbee T W et al. Soft X-ray images of the solar corona with a normal-incidence Cassegrain multilayer telescope[J]. Science, 241, 1781-1787(1988).

[4] Chkhalo N I, Drozdov M N, Kluenkov E B et al. Thin film multilayer filters for solar EUV telescopes[J]. Applied Optics, 55, 4683-4690(2016).

[5] Wagner C, Harned N. Lithography gets extreme[J]. Nature Photonics, 4, 24-26(2010).

[6] Li X P, Yu D Y, Pan Q K et al. Study on beam pointing stability of extreme ultraviolet lithography light source system[J]. Laser & Optoelectronics Progress, 58, 1714004(2021).

[7] Powell F R, Johnson T A. Filter windows for EUV lithography[J]. Proceedings of SPIE, 4343, 585-589(2001).

[8] Yu S S, Lin B, Yen A et al. Thin-film optimization strategy in high numerical aperture optical lithography, part 1: principles[J]. Journal of Microlithography Microfabrication & Microsystems, 4, 043003(2005).

[9] Hatayama M, Takahashi E J, Takenaka H et al. High-throughput beam splitters for high-order harmonics in soft-X-ray region[J]. Proceedings of SPIE, 8077, 80770T(2011).

[10] Zhu J T, Zhou T, Zhu J et al. Study on stress in Si-doped Al thin films prepared by magnetron co-sputtering[J]. Acta Optica Sinica, 40, 1431002(2020).

[11] Liu D M, Yue P F, Fu X H et al. Development of iris recognition filter with low-angle effect[J]. Acta Optica Sinica, 39, 1131002(2019).

[12] Broadway D M, Weimer J, Gurgew D et al. Achieving zero stress in iridium, chromium, and nickel thin films[J]. Proceedings of SPIE, 9510, 95100E(2015).

[13] Thielsch R, Gatto A, Kaiser N. Mechanical stress and thermal-elastic properties of oxide coatings for use in the deep-ultraviolet spectral region[J]. Applied Optics, 41, 3211-3217(2002).

[14] Shao S Y, Fan Z X, Fan R Y et al. A review of study of stress in thin films[J]. Laser & Optoelectronics Progress, 42, 22-27(2005).

[15] Window B. Plastic flow and preferred orientation in molybdenum and zirconium films[J]. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 7, 3036-3042(1989).

[16] Cao H, Zhang C J, Wang S L et al. Residual stress of Zr thin film deposited by magnetic sputtering[J]. Laser Technology, 36, 742-744(2012).

[17] Stoney G G. The tension of metallic films deposited by electrolysis[J]. Proceedings of the Royal Society of London Series A, 82, 172-175(1909).

[18] Youngworth R N, Gallagher B B, Stamper B L. An overview of power spectral density (PSD) calculations[J]. Proceedings of SPIE, 5869, 58690U(2005).

[19] Window B, Sharples F, Savvides N. Summary abstract: investigation of low-energy ion assisted deposition of refractory metals[J]. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 6, 1935-1936(1988).

[20] Wu C T. Intrinsic stress of magnetron-sputtered niobium films[J]. Thin Solid Films, 64, 103-110(1979).

[21] Story H S, Hoffman R W. Stress annealing in vacuum deposited copper films[J]. Proceedings of the Physical Society Section B, 70, 950-960(1957).

[22] Hoffman D W, Kukla C M. Determination of film stresses during sputter deposition using an in situ probe[J]. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 3, 2600-2604(1985).