Acta Optica Sinica, Volume. 41, Issue 18, 1831001(2021)

Microstructure and Stress of Zr Thin Film Deposited by Pulsed DC Sputtering

Jingtao Zhu1,2, Sheng Guo1,2, Jiaoling Zhao2,3、*, Jiayi Zhang1,2, Hangyu Zhu1,2, and Jianda Shao2,3,4
Author Affiliations
  • 1School of Physics Science and Engineering, Tongji University, Shanghai 200092, China
  • 2Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 3Key Laboratory of Materials for High Power Laser, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 4Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou, Zhejiang 310024, China
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    Figures & Tables(6)
    Schematic of Power and radius of curvature
    X-ray diffraction patterns of Zr films on different substrates. (a) JGS1; (b) silicon
    Instensity of diffraction peak of Zr films on different substrates. (a) JGS1; (b) silicon
    Surface roughness of Zr films
    Stress change of Zr film
    Surface metrology of Zr film deposited at different sputtering pressures. (a) 0.05 Pa, before deposition; (b) 0.2 Pa, before deposition; (c) 0.05 Pa, after deposition; (d) 0.2 Pa, after deposition
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    Jingtao Zhu, Sheng Guo, Jiaoling Zhao, Jiayi Zhang, Hangyu Zhu, Jianda Shao. Microstructure and Stress of Zr Thin Film Deposited by Pulsed DC Sputtering[J]. Acta Optica Sinica, 2021, 41(18): 1831001

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    Paper Information

    Category: Thin Films

    Received: Mar. 12, 2021

    Accepted: Apr. 7, 2021

    Published Online: Sep. 3, 2021

    The Author Email: Zhao Jiaoling (jolin923@siom.ac.cn)

    DOI:10.3788/AOS202141.1831001

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