Journal of Semiconductors, Volume. 45, Issue 8, 082501(2024)

Achievable hole concentration at room temperature as a function of Mg concentration for MOCVD-grown p-GaN after sufficient annealing

Siyi Huang1,2,3, Masao Ikeda2,3、*, Feng Zhang2,3, Minglong Zhang1,2,3, Jianjun Zhu2,3, Shuming Zhang1,2,3, and Jianping Liu1,2,3、**
Author Affiliations
  • 1School of Nano-Tech and Nano-Bionics, University of Science and Technology of China, Hefei 230026, China
  • 2Suzhou Institute of Nano-Tech and Nano-Bionics, Chinese Academy of Sciences, Suzhou 215123, China
  • 3Key Laboratory of Nanodevices and Applications, Chinese Academy of Sciences, Suzhou 215123, China
  • show less
    Figures & Tables(6)
    (Color online) Calibration curves of [Mg] for two series of p-GaN samples.
    (Color online) Relationships between p, ρ, and μ for samples A (circles) and B (squares) under different annealing conditions, the solid lines are trendlines.
    (Color online) Residual [H] plot against [Mg] for selected p-GaN samples after annealing.
    (Color online) Dependence of the (a) p, (b) ρ, and (c) μ for each p-GaN sample on [Mg] by RT Hall measurement. Blue solid lines are guides for eyes. Black symbols are taken from literatures[15, 23−26].
    (Color online) Depth profile of Mg, C, O, and Si of a typical p-GaN sample grown at 850 °C after annealing, measured by SIMS.
    (Color online) Dependence of p for each p-GaN sample on [Mg] by RT Hall measurement. Red solid curve is the theoretical curve obtained from this experiment. Black dotted line assumes ND = 1 × 1017 cm−3, NA−=p+ND, and the same EA with the red curve. Black broken line is obtained assuming the same EA with the red curve, NA = [Mg] − [H] and using residual [H] taken from Fig. 3. Blue dots are measured data taken from Fig. 4(a).
    Tools

    Get Citation

    Copy Citation Text

    Siyi Huang, Masao Ikeda, Feng Zhang, Minglong Zhang, Jianjun Zhu, Shuming Zhang, Jianping Liu. Achievable hole concentration at room temperature as a function of Mg concentration for MOCVD-grown p-GaN after sufficient annealing[J]. Journal of Semiconductors, 2024, 45(8): 082501

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Articles

    Received: Jan. 11, 2024

    Accepted: --

    Published Online: Aug. 27, 2024

    The Author Email: Ikeda Masao (mikeda2013@sinano.ac.cn), Liu Jianping (jpliu2010@sinano.ac.cn)

    DOI:10.1088/1674-4926/24010017

    Topics