Journal of Semiconductors, Volume. 45, Issue 8, 082501(2024)
Achievable hole concentration at room temperature as a function of Mg concentration for MOCVD-grown p-GaN after sufficient annealing
Fig. 1. (Color online) Calibration curves of [Mg] for two series of p-GaN samples.
Fig. 2. (Color online) Relationships between p, ρ, and μ for samples A (circles) and B (squares) under different annealing conditions, the solid lines are trendlines.
Fig. 3. (Color online) Residual [H] plot against [Mg] for selected p-GaN samples after annealing.
Fig. 5. (Color online) Depth profile of Mg, C, O, and Si of a typical p-GaN sample grown at 850 °C after annealing, measured by SIMS.
Fig. 6. (Color online) Dependence of p for each p-GaN sample on [Mg] by RT Hall measurement. Red solid curve is the theoretical curve obtained from this experiment. Black dotted line assumes ND = 1 × 1017 cm−3,
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Siyi Huang, Masao Ikeda, Feng Zhang, Minglong Zhang, Jianjun Zhu, Shuming Zhang, Jianping Liu. Achievable hole concentration at room temperature as a function of Mg concentration for MOCVD-grown p-GaN after sufficient annealing[J]. Journal of Semiconductors, 2024, 45(8): 082501
Category: Articles
Received: Jan. 11, 2024
Accepted: --
Published Online: Aug. 27, 2024
The Author Email: Ikeda Masao (mikeda2013@sinano.ac.cn), Liu Jianping (jpliu2010@sinano.ac.cn)