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Journal of Advanced Dielectrics, Volume. 14, Issue 6, 2340011(2024)

Optimizing deposition regimes to fabricate VO2/TiO2/c-Al2O3 thin films for active metasurfaces

M. E. Kutepov1,*... V. E. Kaydashev1, D. V. Stryukov2, A. S. Konstantinov3, A. S. Mikheykin3, A. V. Nikolskiy4, A. T. Kozakov4, A. D. Morozov5, M. A. Kashchenko5, G. V. Alymov5 and E. M. Kaidashev1 |Show fewer author(s)
Author Affiliations
  • 1I. I. Vorovich Mathematics,Mechanics and Computer Science Institute,Laboratory of Nanomaterials,Southern Federal University,200/1 Stachki Avenue,344090 Rostov-on-Don,Russia
  • 2Federal Research Centre,The Southern Scientific Centre of the Russian Academy of Sciences,Chekhov Avenue,41,344006,Rostov-on-Don,Russia
  • 3Physics Faculty,Southern Federal University,5 Zorge Street,344090 Rostov-on-Don,Russia
  • 4Institute of Physics,Southern Federal University,194 Stachki Avenue,344090 Rostov-on-Don,Russia
  • 5Moscow Institute of Physics and Technology (MIPT),Institutskiy 9,141701 Dolgoprudny,Russia
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    M. E. Kutepov, V. E. Kaydashev, D. V. Stryukov, A. S. Konstantinov, A. S. Mikheykin, A. V. Nikolskiy, A. T. Kozakov, A. D. Morozov, M. A. Kashchenko, G. V. Alymov, E. M. Kaidashev. Optimizing deposition regimes to fabricate VO2/TiO2/c-Al2O3 thin films for active metasurfaces[J]. Journal of Advanced Dielectrics, 2024, 14(6): 2340011

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    Paper Information

    Category: Research Articles

    Received: Sep. 29, 2023

    Accepted: Dec. 21, 2023

    Published Online: Jan. 14, 2025

    The Author Email: Kutepov M. E. (kutepov.max@yandex.ru)

    DOI:10.1142/S2010135X23400118

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology