Laser & Optoelectronics Progress, Volume. 54, Issue 6, 60501(2017)

Optimal Design of Depth-Scaling Error with Oblique Incidence

Yang Liangliang*, Liu Chenglin, Zhang Zhihai, and Tang Jian
Author Affiliations
  • [in Chinese]
  • show less

    Based on the expression between diffraction efficiency and incident angle and the expression between diffraction efficiency and micro-structure height error under normal incidence, the mathematical relationship between micro-structure height error and diffraction efficiency or polychromatic integral diffraction efficiency (PIDE) for diffractive optical elements (DOEs) under oblique incidence is established. When the absolute value of the relative micro-structure height errors is equal, the corresponding diffraction efficiency and PIDE with negative micro-structure height errors are higher than those with positive micro-structure height errors. The analysis method and conclusion provide a theoretical reference for the determination of the machining tolerance of micro-structure height error for DOEs.

    Tools

    Get Citation

    Copy Citation Text

    Yang Liangliang, Liu Chenglin, Zhang Zhihai, Tang Jian. Optimal Design of Depth-Scaling Error with Oblique Incidence[J]. Laser & Optoelectronics Progress, 2017, 54(6): 60501

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Diffraction and Gratings

    Received: Jan. 12, 2017

    Accepted: --

    Published Online: Jun. 8, 2017

    The Author Email: Liangliang Yang (yang_liangliang@163.com)

    DOI:10.3788/lop54.060501

    Topics