Chinese Optics Letters, Volume. 11, Issue 9, 090802(2013)
Glass homogeneity effect on wavefront aberration in lithography projection lens
[1] [1] Z. Liao, T. Xing, and H. Zhu, Proc. SPIE 7656, 866846 (2010).
[2] [2] L. Deck, Appl. Opt. 42, 2354 (2003).
[3] [3] Zygo, MST PSurf and MST PHom MetroPro Applications (2003).
[4] [4] H. Liu, Chin. Opt. Lett. 10, 071201 (2012).
[5] [5] H. Shen, R. Zhu, Z. Gao, E. Pun, W. Wong , and X. Zhu, Chin. Opt. Lett. 11, 032201 (2013).
[6] [6] A. Sharma, Appl. Opt. 24, 4367 (1985).
[7] [7] M. Born and E. Wolf, Principle of Optics, 7th ed. (Cambridge University Press, 1999).
[8] [8] Synopsys, Inc. CODE V Electronic Document Library, version 10.5 (2012).
[9] [9] Y. Omura, "Projection exposure methods and apparatus, and projection optical systems", U.S. patent 6,864,961B2 (2005).
[10] [10] T. Matsuyama, I. Tanaka, T. Ozawa, K. Nomura, and T. Koyama, Proc. SPIE 5040, 801 (2003).
Get Citation
Copy Citation Text
Hongbo Shang, Wei Huang, Chunlai Liu, Weicai Xu, Wang Yang. Glass homogeneity effect on wavefront aberration in lithography projection lens[J]. Chinese Optics Letters, 2013, 11(9): 090802
Category: Geometric Optics
Received: Apr. 29, 2013
Accepted: Aug. 2, 2013
Published Online: Sep. 3, 2013
The Author Email: