Chinese Optics Letters, Volume. 11, Issue 9, 090802(2013)

Glass homogeneity effect on wavefront aberration in lithography projection lens

Hongbo Shang, Wei Huang, Chunlai Liu, Weicai Xu, and Wang Yang

Analysis of glass homogeneity using the attaching interferometric data model neglects body distribution. To improve analysis accuracy, we establish the three-dimensional gradient index (GRIN) model of glass index by analyzing fused silica homogeneity distribution in two perpendicular measurement directions. Using the GRIN model, a lithography projection lens with a numerical aperture of 0.75 is analyzed. Root mean square wavefront aberration deteriorates from 0.9 to 9.65 nm and then improves to 5.9 nm after clocking.

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Hongbo Shang, Wei Huang, Chunlai Liu, Weicai Xu, Wang Yang. Glass homogeneity effect on wavefront aberration in lithography projection lens[J]. Chinese Optics Letters, 2013, 11(9): 090802

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Paper Information

Category: Geometric Optics

Received: Apr. 29, 2013

Accepted: Aug. 2, 2013

Published Online: Sep. 3, 2013

The Author Email:

DOI:10.3788/col201311.090802

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