Infrared and Laser Engineering, Volume. 45, Issue 2, 220003(2016)

Study on removal characteristic of silicon carbide surface in precision mechanical polishing

Li Zhuolin1、* and W.B. Lee2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
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    References(14)

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    [9] [9] Yeau-Ren Jeng, Pay-Yau Huang. A material removal rate model considering interfacial micro-contact wear behavior for chemical mechanical polishing[J]. Journal of Tribology, 2005, 127: 190-197.

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    [1] Huang Guojun, Lu Yimin, Cheng Yong, Tian Fangtao, Mi Chaowei, Wan Qiang. Research on infrared optical properties of SiC films by pulsed laser deposition[J]. Infrared and Laser Engineering, 2019, 48(7): 742003

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    Li Zhuolin, W.B. Lee. Study on removal characteristic of silicon carbide surface in precision mechanical polishing[J]. Infrared and Laser Engineering, 2016, 45(2): 220003

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    Paper Information

    Category: 光电器件与微系统

    Received: Jun. 5, 2015

    Accepted: Jul. 15, 2015

    Published Online: Apr. 5, 2016

    The Author Email: Zhuolin Li (zhuolinli666@163.com)

    DOI:10.3788/irla201645.0220003

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