[1] [1] Wittmann J, Kupfer C. Journal of the Electrochemical Society, 2005, 152(2): G148.

[2] [2] Rudolph U, Weikmann E, Kinne A, et al. Proceedings of 2004 IEEE/SEMI Advanced Semiconductor Manufacturing Conference and Workshop, 2004. 89.

[3] [3] Kibe M, Sakai T, Ohiwa T, et al. Proceedings of 2003 IEEE International Symposium on Semiconductor Manufacturing, 2003. 362.

[4] [4] Ram P, Anthony P, Ophir D. Proceedings of SPIE, 2002, 4689: 1077.

[5] [5] Zaidi S, Stojakovic G, Gutmann A, et al. Proceedings of SPIE, 2003, 5038: 185.

[6] [6] Wang Xiaodong, Zeng Wanxue, Lu Guoping, et al. Journal of Vacuum Science and Technology B, 2007, B25(4): 1376.

[7] [7] Jellison G E. Handbook of Silicon Semiconductor Metrology. New York: Marcel-Dekker, Inc., 2001. 723.

[8] [8] Weidner A, Slodowskib M, Halm C, et al. Proceedings of SPIE, 2004, 5375: 232.

[9] [9] Yeh P. Optical Waves in Layered Media. New York: John Wiley & Sons, Inc, 2005. 102.

[14] [14] Zhang Chuangwei, Liu Shiyuan, Shi Tielin, et al. Proceedings of 3rd. IEEE International Conference on Nano/Micro Engineered and Molecular Systems, 2008. 227.

[15] [15] Kessel T, Wickramasinghe H K. Optics Letters, 1999, 24: 1702.