Infrared and Laser Engineering, Volume. 48, Issue 8, 814002(2019)
Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces
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Mao Shanshan, Li Yanqiu, Liu Ke, Liu Lihui, Zheng Meng, Yan Xu. Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces[J]. Infrared and Laser Engineering, 2019, 48(8): 814002
Category: 光学设计
Received: Mar. 5, 2019
Accepted: Apr. 3, 2019
Published Online: Sep. 3, 2019
The Author Email: Shanshan Mao (mss_lion@163.com)