Infrared and Laser Engineering, Volume. 48, Issue 8, 814002(2019)

Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces

Mao Shanshan*, Li Yanqiu, Liu Ke, Liu Lihui, Zheng Meng, and Yan Xu
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    Mao Shanshan, Li Yanqiu, Liu Ke, Liu Lihui, Zheng Meng, Yan Xu. Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces[J]. Infrared and Laser Engineering, 2019, 48(8): 814002

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    Paper Information

    Category: 光学设计

    Received: Mar. 5, 2019

    Accepted: Apr. 3, 2019

    Published Online: Sep. 3, 2019

    The Author Email: Shanshan Mao (mss_lion@163.com)

    DOI:10.3788/irla201948.0814002

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