Infrared and Laser Engineering, Volume. 48, Issue 8, 814002(2019)
Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces
Figures & Tables(0)
Tools
Get Citation
Copy Citation Text
Mao Shanshan, Li Yanqiu, Liu Ke, Liu Lihui, Zheng Meng, Yan Xu. Optical design of high numerical aperture extreme ultraviolet lithography objective with freeform surfaces[J]. Infrared and Laser Engineering, 2019, 48(8): 814002
Paper Information
Category: 光学设计
Received: Mar. 5, 2019
Accepted: Apr. 3, 2019
Published Online: Sep. 3, 2019
The Author Email: Shanshan Mao (mss_lion@163.com)
© Copyright 2018-2021 | Chinese Laser Press.
All Rights Reserved 沪ICP备15018463号-20