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Chinese Optics Letters, Volume. 8, Issue 1, 41(2010)

The mulDamage characteristics of HfO2/SiO2 high reflector at 45° incidence in 1-on-1 and N-on-1 tests

Xiaofeng Liu1,2, Dawei Li1, Yuan'an Zhao1, Xiao Li1,2, Xiulan Ling1,2, and Jianda Shao1
Author Affiliations
  • 1Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Graduate School of the Chinese Academy of Sciences, Beijing 100049, China
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    Xiaofeng Liu, Dawei Li, Yuan'an Zhao, Xiao Li, Xiulan Ling, Jianda Shao. The mulDamage characteristics of HfO2/SiO2 high reflector at 45° incidence in 1-on-1 and N-on-1 tests[J]. Chinese Optics Letters, 2010, 8(1): 41

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    Paper Information

    Received: Feb. 26, 2009

    Accepted: --

    Published Online: Mar. 1, 2010

    The Author Email:

    DOI:10.3788/COL20100801.0041

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology