Chinese Optics Letters, Volume. 8, Issue 1, 41(2010)
The mulDamage characteristics of HfO2/SiO2 high reflector at 45° incidence in 1-on-1 and N-on-1 tests
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Xiaofeng Liu, Dawei Li, Yuan'an Zhao, Xiao Li, Xiulan Ling, Jianda Shao. The mulDamage characteristics of HfO2/SiO2 high reflector at 45° incidence in 1-on-1 and N-on-1 tests[J]. Chinese Optics Letters, 2010, 8(1): 41
Received: Feb. 26, 2009
Accepted: --
Published Online: Mar. 1, 2010
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