Chinese Optics Letters, Volume. 8, Issue 1, 41(2010)

The mulDamage characteristics of HfO2/SiO2 high reflector at 45° incidence in 1-on-1 and N-on-1 tests

Xiaofeng Liu1,2, Dawei Li1, Yuan'an Zhao1, Xiao Li1,2, Xiulan Ling1,2, and Jianda Shao1
Author Affiliations
  • 1Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 2Graduate School of the Chinese Academy of Sciences, Beijing 100049, China
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    P-polarization high reflectors are deposited by e-beam from hafnia and silica. 1-on-1 and N-on-1 tests at 1064-nm wavelength with P-polarization at 45° incidence are carried out on these samples. Microscope and scanning electron microscope are applied to investigate the damage morphologies in both 1-on-1 and N-on-1 tests. It is found that the laser damage threshold is higher in N-on-1 tests and nodular defect is the main inducement that leads to the damage because nodular ejection with plasma scalding is the typical damage morphology. Similar damage morphology observed in the two tests indicates that the higher laser damage threshold in N-on-1 test is attributed to the mechanical stabilization process of nodular defects, owing to the gradually increased laser fluence radiation. Based on the typical morphology study, some process optimizations are given.

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    Xiaofeng Liu, Dawei Li, Yuan'an Zhao, Xiao Li, Xiulan Ling, Jianda Shao. The mulDamage characteristics of HfO2/SiO2 high reflector at 45° incidence in 1-on-1 and N-on-1 tests[J]. Chinese Optics Letters, 2010, 8(1): 41

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    Paper Information

    Received: Feb. 26, 2009

    Accepted: --

    Published Online: Mar. 1, 2010

    The Author Email:

    DOI:10.3788/COL20100801.0041

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