Laser & Optoelectronics Progress, Volume. 59, Issue 11, 1100010(2022)

Research Progress of Maskless Digital Lithography Based on Digital Micromirror Device

Fanglin Xie, Lei Wang, and Shengzhou Huang*
Author Affiliations
  • School of Mechanical Engineering, Anhui Polytechnic University, Wuhu 241000, Anhui , China
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    References(1)

    [2] Chen L S, Qiao W, Ye Y et al. Critical technologies of micro-nano-manufacturing and its applications for flexible optoelectronic devices[J]. Acta Optica Sinica, 41, 0823018(2021).

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    Fanglin Xie, Lei Wang, Shengzhou Huang. Research Progress of Maskless Digital Lithography Based on Digital Micromirror Device[J]. Laser & Optoelectronics Progress, 2022, 59(11): 1100010

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    Paper Information

    Category: Reviews

    Received: Jul. 22, 2021

    Accepted: Sep. 8, 2021

    Published Online: Jun. 9, 2022

    The Author Email: Huang Shengzhou (1024739781@qq.com)

    DOI:10.3788/LOP202259.1100010

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