Maskless lithography has a wide range of applications in microstructure fabrication due to its advantages of no physical mask, low cost and suitability for mass production. Maskless digital lithography based on digital micromirror device (DMD) has the advantages of high resolution, good flexibility and high processing accuracy, which has become a research hotspot in the field of lithography in recent years. This paper reviews the research progress of DMD digital lithography, including DMD-based scanning lithography, stepping lithography and gray-scale lithography, and introduces the applications of the method in integrated circuit, micro-optics, three-dimensional printing and other fields, the paper also summarizes the current problems of DMD lithography and its future development trend.