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Chinese Optics Letters, Volume. 15, Issue 6, 062201(2017)

Versatile nanosphere lithography technique combining multiple-exposure nanosphere lens lithography and nanosphere template lithography

Yonghui Zhang1,2, Zihui Zhang1,2, Chong Geng1,2, Shu Xu1,2, Tongbo Wei3、*, and Wen'gang Bi1,2
Author Affiliations
  • 1Institute of Micro-Nano Photoelectron and Electromagnetic Technology Innovation, School of Electronics and Information Engineering, Hebei University of Technology, Tianjin 300401, China
  • 2Key Laboratory of Electronic Materials and Devices of Tianjin, Tianjin 300401, China
  • 3Semiconductor Lighting Technology Research and Development Center, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
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    Yonghui Zhang, Zihui Zhang, Chong Geng, Shu Xu, Tongbo Wei, Wen'gang Bi. Versatile nanosphere lithography technique combining multiple-exposure nanosphere lens lithography and nanosphere template lithography[J]. Chinese Optics Letters, 2017, 15(6): 062201

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Jan. 23, 2017

    Accepted: Feb. 17, 2017

    Published Online: Jul. 20, 2018

    The Author Email: Tongbo Wei (tbwei@semi.ac.cn)

    DOI:10.3788/COL201715.062201

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology