Versatile nanosphere lithography technique combining multiple-exposure nanosphere lens lithography and nanosphere template lithography

Yonghui Zhang; Zihui Zhang; Chong Geng; Shu Xu; Tongbo Wei; Wen'gang Bi

doi:10.3788/COL201715.062201

Chinese Optics Letters, Volume. 15, Issue 6, 062201(2017)

Versatile nanosphere lithography technique combining multiple-exposure nanosphere lens lithography and nanosphere template lithography

Yonghui Zhang^1,2, Zihui Zhang^1,2, Chong Geng^1,2, Shu Xu^1,2, Tongbo Wei^3、*, and Wen'gang Bi^1,2

Author Affiliations

¹Institute of Micro-Nano Photoelectron and Electromagnetic Technology Innovation, School of Electronics and Information Engineering, Hebei University of Technology, Tianjin 300401, China

²Key Laboratory of Electronic Materials and Devices of Tianjin, Tianjin 300401, China

³Semiconductor Lighting Technology Research and Development Center, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China

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Yonghui Zhang, Zihui Zhang, Chong Geng, Shu Xu, Tongbo Wei, Wen'gang Bi. Versatile nanosphere lithography technique combining multiple-exposure nanosphere lens lithography and nanosphere template lithography[J]. Chinese Optics Letters, 2017, 15(6): 062201

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Paper Information

Category: Optical Design and Fabrication

Received: Jan. 23, 2017

Accepted: Feb. 17, 2017

Published Online: Jul. 20, 2018

The Author Email: Tongbo Wei (tbwei@semi.ac.cn)

DOI:10.3788/COL201715.062201

Topics

laser devices and laser physics

Lasers and Laser Optics

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Instrumentation, Measurement and Metrology