Journal of Applied Optics, Volume. 40, Issue 2, 284(2019)

Research on high deterministic removal characteristics of fused quartz using RF focused ion beam source

XI Yingxue*... LIU Weiguo, MA Zhanpeng, ZHANG Jin and ZHOU Shun |Show fewer author(s)
Author Affiliations
  • [in Chinese]
  • show less
    References(20)

    [1] [1] ARNOLD T, BHM G, FECHNER R, et al. Ultra-precision surface finishing by ion beam and plasma jet techniques: status and outlook[J]. Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 2010, 616(2/3): 147-156.

    [2] [2] ALLEN L N. Progress in ion figuring large optics[J]. SPIE, 1994, 2428: 237-247.

    [3] [3] LI Shengyi, DAI Yifan, XIE Xuhui, et al. New technology for manufacturing and measurement of large and middle-scale aspheric surfaces[M]. Beijing: National Defense Industry Press, 2011.

    [4] [4] FAWCETT S C. Ion beam figuring of small optical components[J]. Optical Engineering, 1995, 34(12): 3565.

    [5] [5] ALLEN L N, HANNON J H , WAMBACH R W. Final surface error correction of an off-axis aspheric petal by ionFiguring[J]. SPIE, 1991,1543: 190-200.

    [7] [7] WANG Dongfang. Research on atmospheric pressure plasma processing technology of fused silicon[J]. Journal of Shaanxi University of Technology: Natural Science Edition, 2013, 29(2): 1-5.

    [8] [8] PHILIP S H.Optica needs for futrue space telescopes[J]. SPIE, 2003,5180: 1-5.

    [9] [9] ALLEN D M, SHORE P, EVANS R W, et al. Ion beam, focused ion beam, and plasma discharge machining[J]. CIRP Annals, 2009, 58(2): 647-662.

    [10] [10] CHEN Guiyang, XIE Xuhui, ZHOU Lin, et al. Removal function and stability study of RF ion source for optics figuring[J]. Aviation Precision Manufacturing Technology, 2016, 52(5): 19-22,40.

    [11] [11] LIU Jinsheng.Ion beam technology and application[M]. Beijing: National Defense Industry Press,1995.

    [12] [12] ZHANG Zhenpeng, XIE Xuhui, ZHOU Lin, et al. Structure design and performance research of RF neutralizer for optics figuring[J]. Aviation Precision Manufacturing Technology, 2017, 53(3): 8-11,15.

    [14] [14] ALLEN L N, KEIM R E. An ion figuring system for large optic fabrication[J]. SPIE, 1989,1168: 33-50.

    [16] [16] DUAN Guping.Study of removal characteristics of ion beam polishing[D].Chengdu: Graduate School of Chinese Academy Sciences(Institute of Optics and electronics),2013.

    [17] [17] KATARDJIEV I V. A kinematic model of surface evolution during growth and erosion: numerical analysis[J]. Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 1989, 7(6): 3222-3232.

    [18] [18] STEINBR CHEL C. Universal energy dependence of physical and ion-enhanced chemical etch yields at low ion energy[J]. Applied Physics Letters, 1989, 55(19): 1960-1962.

    [19] [19] SIGMUND P. Sputtering by particle bombardment I[M]. Berlin: Springer-Verag, 1981.

    Tools

    Get Citation

    Copy Citation Text

    XI Yingxue, LIU Weiguo, MA Zhanpeng, ZHANG Jin, ZHOU Shun. Research on high deterministic removal characteristics of fused quartz using RF focused ion beam source[J]. Journal of Applied Optics, 2019, 40(2): 284

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Jan. 5, 2018

    Accepted: --

    Published Online: Mar. 26, 2019

    The Author Email: Yingxue XI (xiyingxue@163.com)

    DOI:10.5768/jao201940.0203002

    Topics