Journal of Semiconductors, Volume. 44, Issue 4, 044101(2023)
A new DRIE cut-off material in SOG MEMS process
[3] B Johnson, K Christ, D Endean et al. Tuning fork MEMS gyroscope for precision northfinding. 2015 DGON Inertial Sensors and Systems Symposium, 1(2015).
[20] M Cai, C Si, G Han et al. Deep silicon etching of bonded wafer based on ITO mask. J Micronanoelectron Technol, 57, 11(2020).
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Chaowei Si, Yingchun Fu, Guowei Han, Yongmei Zhao, Jin Ning, Zhenyu Wei, Fuhua Yang. A new DRIE cut-off material in SOG MEMS process[J]. Journal of Semiconductors, 2023, 44(4): 044101
Category: Articles
Received: Sep. 13, 2022
Accepted: --
Published Online: Apr. 24, 2023
The Author Email: Si Chaowei (schw@semi.ac.cn)