Journal of Semiconductors, Volume. 44, Issue 4, 044101(2023)
A new DRIE cut-off material in SOG MEMS process
Fig. 1. (Color online) DRIE process. (a) Foot effect on SOI. (b) DRIE on SOG.
Fig. 2. (Color online) The preparation of structures. (a) Etching with glue mask drilling. (b) ITO sputtering. (c) Lift off. (d) Anodic bonding. (e) DRIE. (f) Release.
Fig. 3. (Color online) The process of glass cover plate with filled vias. (a) Laser drilling. (b) Electroplating. (c) Active area etching.
Fig. 6. (Color online) The etched structures. (a) ITO cut-off film. (b) The released and packaged structures.
Fig. 9. The frequency domain response of a prepared accelerometer.
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Chaowei Si, Yingchun Fu, Guowei Han, Yongmei Zhao, Jin Ning, Zhenyu Wei, Fuhua Yang. A new DRIE cut-off material in SOG MEMS process[J]. Journal of Semiconductors, 2023, 44(4): 044101
Category: Articles
Received: Sep. 13, 2022
Accepted: --
Published Online: Apr. 24, 2023
The Author Email: Si Chaowei (schw@semi.ac.cn)