[1] [1] Yao M H, Hu S, Xing T W. Optical Projection Exposure Micro-Nano Processing Technology[M]. Beijing: Beijing University of Technology Press, 2006.

[3] [3] Quan H Y. Uncertainty evaluation for interferometric testing of absolute surface figure error[D]. Chengdu: University of Chinese Academy of Sciences, 2017.

[4] [4] Poultney S K. Methods for measuring a wavefront of an optical system: 7602503[P]. 2009-10-13.

[5] [5] Latypov A, Poultney S K, Vladimirsky Y. Method and system for wavefront measurements of an optical system: 7768653[P]. 2010-08-03.

[20] [20] Zhao L. Imaging performance compensation strategy and compensation technology of lithography lens[D]. Changchun: University of Chinese Academy of Sciences, 2017.

[21] [21] Fang C. Research on lateral shearing interferometry in measurement of wavefront aberration of lithography lens[D]. Changchun: University of Chinese Academy of Sciences, 2018.

[34] [34] Xu W C. Optical design and imaging performance compensation for the lithographic lens[D]. Changchun: University of Chinese Academy of Sciences, 2011.

[40] [40] Schreiber H, Bruning J H. Phase shifting interferometry[M]//Malacara D. Optical Shop Testing. Hoboken: John Wiley & Sons, Inc., 1992.

[41] [41] Chen X J. Study on the influence of intensity distribution on wavefront reconstruction by quadri-wave lateral shearing interferometers[D]. Chengdu: University of Chinese Academy of Sciences, 2019.

[47] [47] Yang Y Y, Ling T. Novel Common-Path Interferometers[M]. Hangzhou: Zhejiang University Press, 2020.

[51] [51] Harris J S. The universal Fizeau interferometer[D]. Reading: University of Reading, 1971.

[70] [70] Zhang Y W. Research on rotational absolute testing of the optical surtace[D]. Changchun: University of Chinese Academy of Sciences, 2014.

[73] [73] Ma H. Absolute detection method of wavefront error of spherical lens[D]. Beijing: China Academy of Engineering Physics, 2014.

[80] [80] Miyakawa R H. Wavefront metrology for High Resolution optical systems[D]. Berkeley: University of California, 2011.

[81] [81] Goldberg K A. Extreme ultraviolet interferometry[D]. Berkeley: University of California, 1997.

[82] [82] Li J, Wang X C, Tang F, et al. Systematic error elimination method for wave aberration detection by grating shear interferometer: CN103674493A[P]. 2014-03-26.

[93] [93] Otaki K, Kohara N, Sugisaki K, et al. Ultra high-precision wavefront metrology using EUV low brightness source[M]//Osten W. Fringe 2013. Berlin: Springer, 2014: 385–392.

[96] [96] Sommargren G E. Phase shifting diffraction interferometry for measuring extreme ultraviolet optics[R]. Boston, MA: Lawrence Livermore National Laboratory, 1996.

[98] [98] Yang Y Y. Advanced Interferometry and Application[M]. Hangzhou: Zhejiang University Press, 2017.