Opto-Electronic Engineering, Volume. 50, Issue 5, 220001(2023)

Review of absolute measurement of wavefront aberration in lithography objective

Qinglan Wang... Haiyang Quan, Song Hu*, Junbo Liu and Xi Hou |Show fewer author(s)
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    Figures & Tables(34)
    Wave aberration detection method
    Principle of Twyman-Green interferometer detection lithography objective[34]
    The principle of Fizeau interferometer detection lithography objective[35]
    Schematic diagram of the principle of Shack-Hartmann wavefront sensing technology[38]
    Schematic diagram of the principle of Shack-Hartmann wavefront sensing technology[39]
    Schematic diagram of transverse shear interferometry[41]
    ILIAS technology based on Ronchi shear interference principle[42]
    Phase-shifted point diffraction interferometer structure[45]
    i-PMI technology based on the principle of line diffraction interference[7]
    Absolute detection method
    Schematic diagram of classic three-plane combination measurement[49]
    Schematic diagram of absolute detection of double spheres based on three positions[52]
    Schematic diagram of rotation and translation method[60]
    Schematic diagram of the principle of rotating average method[70]
    Schematic diagram of the principle of random ball method[72]
    Wavefront aberration of lithography objective absolute detection technology
    Schematic diagram of Fizeau interferometer measurement[73]
    Schematic diagram of translation and subtraction[73]
    Cat’s-eye test configuration of spherical interferometer[74]
    Wavefront aberration measurement of the objective lens using a plane mirror[75]. (a) Without tilt; (b) With tilt angle ∆θ.
    Schematic diagram of absolute detection principle based on random sphere method[76]
    Principle of self-calibration of Shack-Hartmann wavefront measurement[78]
    Classical structure of grating transverse shearing interferometer[80]
    Schematic diagram of Talbot order method[93]
    Schematic diagram of system error calibration by Talbot number method[93]
    Schematic diagram of calibration mask method[93]
    Experimental results of three calibration methods[93]
    Absolute detection based on spot diffraction[94]
    System error calibration of PS/PDI detection by rotating grating method[95]
    Absolute detection based on optical fiber point diffraction measurement technology[99]
    • Table 1. Objective lens specific parameters

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      Table 1. Objective lens specific parameters

      物镜NA有效焦距/mm入瞳直径工作距离/mm
      A0.144011.2 mm/373pixels34
      B0.654.55.9 mm/197pixels0.6
      C0.91.83.3 mm/110pixels1.0
    • Table 2. Relative RMS error of different objective lenses test results

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      Table 2. Relative RMS error of different objective lenses test results

      物镜最大/%最小/%平均/%
      A18.68.513.9
      B21.48.916.4
      C23.313.719.7
    • Table 3. Detection accuracy of different rotation angles

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      Table 3. Detection accuracy of different rotation angles

      旋转角度/(°)PV/mλRMS/mλ
      90293.2
      135427.7
      1805712.3
    • Table 4. Comparison of absolute detection of wave aberration of four different lithography objectives

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      Table 4. Comparison of absolute detection of wave aberration of four different lithography objectives

      采集图像数量可实现性精度
      传统干涉法双球面法一般一般
      随机球法复杂
      基于哈特曼法的绝对检测简单一般
      光栅横向剪切旋转物镜法较多一般较高
      Talbot数法简单
      掩模标定法复杂
      基于点衍射的绝对检测复杂
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    Qinglan Wang, Haiyang Quan, Song Hu, Junbo Liu, Xi Hou. Review of absolute measurement of wavefront aberration in lithography objective[J]. Opto-Electronic Engineering, 2023, 50(5): 220001

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    Paper Information

    Category: Article

    Received: Feb. 16, 2022

    Accepted: May. 27, 2022

    Published Online: Jul. 4, 2023

    The Author Email:

    DOI:10.12086/oee.2023.220001

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