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Acta Optica Sinica, Volume. 42, Issue 23, 2312001(2022)

High-Precision Measurement Method of Polarization Aberrations for Large Numerical Aperture (NA=0.55) Variable-Magnification Extreme Ultraviolet Lithography Projection Objective

Ang Li, Yanqiu Li*, Pengzhi Wei, Miao Yuan, and Chengcheng Wang
Author Affiliations
  • Key Laboratory of Photoelectronic Imaging Technology and System, Ministry of Education, School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China
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    AbstractGet PDF(in Chinese)
    Figures&Tables (12)
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    References (27)
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    Figures & Tables(12)
    Diagram of EUV imaging system

    Fig. 1. Diagram of EUV imaging system

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    Mask diffraction far field obtained by strict electromagnetic field simulation

    Fig. 2. Mask diffraction far field obtained by strict electromagnetic field simulation

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    Principle of synchronous rotation measurement method

    Fig. 3. Principle of synchronous rotation measurement method

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    Process of simulation

    Fig. 4. Process of simulation

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    Polarization aberration extracted from ray tracing of designed projection objective by CODE V

    Fig. 5. Polarization aberration extracted from ray tracing of designed projection objective by CODE V

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    Average errors of polarization aberration expansion coefficient a. (a) Real part; (b) imaginary part

    Fig. 6. Average errors of polarization aberration expansion coefficient a. (a) Real part; (b) imaginary part

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    Average errors of polarization aberration expansion coefficient b. (a) Real part; (b) imaginary part

    Fig. 7. Average errors of polarization aberration expansion coefficient b. (a) Real part; (b) imaginary part

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    Average errors of polarization aberration expansion coefficient a'. (a) Real part; (b) imaginary part

    Fig. 8. Average errors of polarization aberration expansion coefficient a'. (a) Real part; (b) imaginary part

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    Average errors of polarization aberration expansion coefficient b'. (a) Real part; (b) imaginary part

    Fig. 9. Average errors of polarization aberration expansion coefficient b'. (a) Real part; (b) imaginary part

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    Jones pupil average errors

    Fig. 10. Jones pupil average errors

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    • Table 1. Simulation parameters for nonlinear imaging measurement method of polarization aberration

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      Table 1. Simulation parameters for nonlinear imaging measurement method of polarization aberration

      ParameterConfigurationParameterConfiguration
      NA0.55Mask material

      16.4 nm Al2O3

      37.5 nm TaN

      Variable-ratio

      4×（horizontal direction）

      8×（vertical direction）

      		Mask pitch /nm140-210
      Λ /nm13.5Coherence factor0.35
      Mask patternOne-dimensional dense lineOrientation /（°）-40-40
      Mask duty cycle1∶1Simulation times500

    • Table 2. RMSE of Jones pupil of proposed EUV method

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      Table 2. RMSE of Jones pupil of proposed EUV method

      Jones pupilRe｛Jxx｝Im｛Jxx｝Re｛Jxy｝Im｛Jxy｝Re｛Jyx｝Im｛Jyx｝Re｛Jyy｝Im｛Jyy｝Average
      RMSE /λ1.129×10-39.674×10-49.345×10-48.013×10-41.080×10-36.584×10-41.002×10-38.675×10-49.300×10-4
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    Ang Li, Yanqiu Li, Pengzhi Wei, Miao Yuan, Chengcheng Wang. High-Precision Measurement Method of Polarization Aberrations for Large Numerical Aperture (NA=0.55) Variable-Magnification Extreme Ultraviolet Lithography Projection Objective[J]. Acta Optica Sinica, 2022, 42(23): 2312001

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    Paper Information

    Category: Instrumentation, Measurement and Metrology

    Received: May. 17, 2022

    Accepted: Jun. 11, 2022

    Published Online: Dec. 14, 2022

    The Author Email: Li Yanqiu (liyanqiu@bit.edu.cn)

    DOI:10.3788/AOS202242.2312001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology