Laser & Optoelectronics Progress, Volume. 53, Issue 4, 42302(2016)
Fabrication of Large Size 1064 nm HfO2/SiO2 Narrow-Band Filters with High Laser Damage Threshold
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Wu Xiaoming, Li Xin, Wang Yijian, Jiao Hongfei. Fabrication of Large Size 1064 nm HfO2/SiO2 Narrow-Band Filters with High Laser Damage Threshold[J]. Laser & Optoelectronics Progress, 2016, 53(4): 42302
Category: Optical Devices
Received: Sep. 13, 2015
Accepted: --
Published Online: Mar. 25, 2016
The Author Email: Xiaoming Wu (wxmly@263.net)