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Laser & Optoelectronics Progress, Volume. 53, Issue 4, 42302(2016)

Fabrication of Large Size 1064 nm HfO2/SiO2 Narrow-Band Filters with High Laser Damage Threshold

Wu Xiaoming1、*, Li Xin1, Wang Yijian1, and Jiao Hongfei2
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    Wu Xiaoming, Li Xin, Wang Yijian, Jiao Hongfei. Fabrication of Large Size 1064 nm HfO2/SiO2 Narrow-Band Filters with High Laser Damage Threshold[J]. Laser & Optoelectronics Progress, 2016, 53(4): 42302

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    Paper Information

    Category: Optical Devices

    Received: Sep. 13, 2015

    Accepted: --

    Published Online: Mar. 25, 2016

    The Author Email: Xiaoming Wu (wxmly@263.net)

    DOI:10.3788/lop53.042302

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology