Fig. 1. Experimental system for damage of monocrystalline silicon by long pulse laser

Fig. 2. Evolution of relationship between center temperature of monocrystalline silicon irradiated by lasers and time

Fig. 3. Relationship between the peak temperature of center point of monocrystalline silicon laser irradiation and the energy density and pulse width

Fig. 4. Temperature variation and with energy density and pulse width

Fig. 5. Cleavage damage structure of monocrystalline silicon

Fig. 6. Metallographic structure of multi-effect coupling damage in monocrystalline silicon

Fig. 7. Peak corrosion damage structure of monocrystalline silicon

Fig. 8. Relationships between damage depth and laser energy density

Fig. 9. Relationship between the etching depth of monocrystalline silicon and number of pulse