[1] [1] FERRERA J. Nanometer-scale placement in electron-beam lithography［D］. Cambridge: Massachusetts Institute of Technology, 2000.

[2] [2] ZHAO Y, TRUMPER D L, HEILMANN R K, et al. Optimization and temperature mapping of an ultra-high thermal stability environmental enclosure［J］. Precision Engineering, 2010, 34(1): 164-170.

[3] [3] HAEFER M, PRUSS C, OSTEN W. Laser direct writing of rotationally symmetric high-resolution structures［J］. Applied Optics, 2011, 50(31): 5983-5989.

[4] [4] YOUNG P P, PRIAMBODO P S, MALDONADO T A, et al. Simple interferometric fringe stabilization by charge-coupled-device-based feedback control［J］. Applied Optics, 2006, 45(19): 4563-4566.

[5] [5] HREBABETZKY F, ALBERTAZZI J A, VEIGA C L N. Camera-based active phase stabilization for electronic holography［C］. Laser Metrology for Precision Management and Inspection in Industry. International Society for Optics and Photonics, 2001: 155-161.

[6] [6] SONG Ying, Bayanheshig, QI Xiang-dong, et al. Design of frequency-shift interference fringe locking system in holographic grating exposure［J］. Optics and Precision Engineering, 2014, 22(2): 318-324.

[7] [7] HEILMANN R K, KONKOLA P T, CHEN C G, et al. Digital heterodyne interference fringe control system［J］. Journal of Vacuum Science & Technology B, 2001, 19(6): 2342-2346.

[9] [9] TANG Jun-xiong. Optical beating and interference［J］. College Physics, 1990, (1): 10-12.

[10] [10] MA Li-na, ZHANG Jin, JIANG Shi-lei, et al. Influence on patterns quality of multi-beam interference lithography caused by the deviations of incidence azimuth angle and intensity of light［J］. Acta Photonica Sinica, 2015, 44(10): 1011003.

[11] [11] KONKOLA P T. Design and analysis of a scanning beam interference lithography system for patterning gratings with nanometer-level distortions［D］. Cambridge: Massachusetts Institute of Technology, 2003.

[12] [12] FORSSELL U. Closed-loop identification: methods, theory, and applications［D］. Sweden: Linkping University, 1999.

[13] [13] ZIEGLER J G, NICHOLS N B. Optimum settings for automatic controllers［J］. Journal of Dynamic Systems Measurement & Control, 1993, 115(2B): 759-768.

[15] [15] QIAN Guo-lin, LI Chao-ming, YIN Qing-yan, et al. Study of characteristic of fringe locking system used to holographic exposure［J］. Laser Technology, 2008, 32(6): 648-654.