Acta Photonica Sinica, Volume. 46, Issue 1, 123001(2017)

Analysis and Controller Design of Fringe Phase Locking System for Interference Lithography

LU Sen*... YANG Kai-ming, ZHU Yu, ZHANG Ming, WANG Lei-jie and HU Chu-xiong |Show fewer author(s)
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    References(13)

    [1] [1] FERRERA J. Nanometer-scale placement in electron-beam lithography[D]. Cambridge: Massachusetts Institute of Technology, 2000.

    [2] [2] ZHAO Y, TRUMPER D L, HEILMANN R K, et al. Optimization and temperature mapping of an ultra-high thermal stability environmental enclosure[J]. Precision Engineering, 2010, 34(1): 164-170.

    [3] [3] HAEFER M, PRUSS C, OSTEN W. Laser direct writing of rotationally symmetric high-resolution structures[J]. Applied Optics, 2011, 50(31): 5983-5989.

    [4] [4] YOUNG P P, PRIAMBODO P S, MALDONADO T A, et al. Simple interferometric fringe stabilization by charge-coupled-device-based feedback control[J]. Applied Optics, 2006, 45(19): 4563-4566.

    [5] [5] HREBABETZKY F, ALBERTAZZI J A, VEIGA C L N. Camera-based active phase stabilization for electronic holography[C]. Laser Metrology for Precision Management and Inspection in Industry. International Society for Optics and Photonics, 2001: 155-161.

    [7] [7] HEILMANN R K, KONKOLA P T, CHEN C G, et al. Digital heterodyne interference fringe control system[J]. Journal of Vacuum Science & Technology B, 2001, 19(6): 2342-2346.

    [9] [9] TANG Jun-xiong. Optical beating and interference[J]. College Physics, 1990, (1): 10-12.

    [11] [11] KONKOLA P T. Design and analysis of a scanning beam interference lithography system for patterning gratings with nanometer-level distortions[D]. Cambridge: Massachusetts Institute of Technology, 2003.

    [12] [12] FORSSELL U. Closed-loop identification: methods, theory, and applications[D]. Sweden: Linkping University, 1999.

    [13] [13] ZIEGLER J G, NICHOLS N B. Optimum settings for automatic controllers[J]. Journal of Dynamic Systems Measurement & Control, 1993, 115(2B): 759-768.

    [15] [15] QIAN Guo-lin, LI Chao-ming, YIN Qing-yan, et al. Study of characteristic of fringe locking system used to holographic exposure[J]. Laser Technology, 2008, 32(6): 648-654.

    CLP Journals

    [1] WANG Lei-jie, ZHANG Ming, ZHU Yu, LU Sen, YANG Kai-ming. Ultra-precision phase-shifting locking system of scanning beam interference lithography tool[J]. Optics and Precision Engineering, 2019, 27(8): 1765

    [2] ZHANG Dong, ZHAO Chengqiang, XU Wendong, ZHANG Yibin, YAN Yuqi. Locking of the Fringe Position and Period in Largesize Holographic Grating Exposure[J]. Acta Photonica Sinica, 2018, 47(2): 205001

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    LU Sen, YANG Kai-ming, ZHU Yu, ZHANG Ming, WANG Lei-jie, HU Chu-xiong. Analysis and Controller Design of Fringe Phase Locking System for Interference Lithography[J]. Acta Photonica Sinica, 2017, 46(1): 123001

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    Paper Information

    Received: Jul. 14, 2016

    Accepted: --

    Published Online: Feb. 9, 2017

    The Author Email: Sen LU (lus13@mails.tsinghua.edu.cn)

    DOI:10.3788/gzxb20174601.0123001

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