Infrared and Laser Engineering, Volume. 53, Issue 6, 20240124(2024)
Design and implementation of high precision on-line measurement system for pulse parameters of ArF Excimer laser
[1] [1] DAS P, MTON R, FOMENKOV I, et al. Perfmance of 1 kHz KrF excimer laser f DUV lithography[C]XI International Symposium on Gas Flow Chemical Lasers HighPower Laser Conference (GCLHPL 96), 1996: 467470.
[2] [2] YOSHINO M, NAKARAI H, OHTA T, et al. Highpower highenergy stability injection lock laser light source f double exposure double patterning ArF immersion lithography art. no. 69242S[C]Conference on Optical Microlithography XXI, 2008: S9242.
[3] Yanli LI, Xianhe LIU, Qiang WU. Evolution and updates of advanced photolithography technology. Laser & Optoelectronics Progress, 59, 0922006(2022).
[4] [4] STAMM U, PAETZEL R, BRAGIN I, et al. Highrepetitionrate ultranarrowbwidth 193nm excimer lasers f DUV lithography[C]Optical Microlithography XIII, 2000: 13901396.
[5] Liang XU, Qihui SHEN, Jingzhen SHAO. Discharge-pumped excimer laser technologies and applications. Laser & Optoelectronics Progress, 60, 1900006(2023).
[6] Rui JIANG. Key technologies and applications of excimer laser as light sources in lithography. Laser & Optoelectronics Progress, 59, 337-354(2022).
[7] Xu LIANG, Libin YOU, Yinshan YU. Excimer laser pulse energy detection under pulse repetition running mode. Chinese Journal of Quantum Electronics, 27, 281-287(2010).
[9] [9] XIE Chenke, CHEN Ming, YANG Baoxi, et al. Development perfmance testing of pulsed excimer laser energy detect[J]. Chinese Journal of Lasers , 2015, 42(1): 0102006. (in Chinese)
[10] [10] LI Wenjie, ZHAO Duliang, LIN Yin, et al. Design of highly sensitive online detecting system f ultraviolet pulse lasers energy[J]. Infrared Laser Engineering , 2017, 46(12): 1222002. (in Chinese)
[12] [12] FELLNER G, SPECKBACHER L, MOUSAVI S M, et al. Nanosecond peak detect hold circuit with adjustable dynamic range[J]. IEEE Transactions on Instrumentation Measurement , 2023, 72( 200 ): 55015508.
[16] [16] LIPIKA P, BHARATH M, SUGANYA S, et al. Design of high precision peak detect sample & hold architecture f spectroscopy applications[C]3rd IEEE International Conference on Emerging Smart Computing Infmatics (IEEEESCI), 2021: 8791.
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Wanqi ZHAO, Rui JIANG, Zebin FENG, Ze XU, Ning GUO, Yan JIANG, Jingguo ZHU. Design and implementation of high precision on-line measurement system for pulse parameters of ArF Excimer laser[J]. Infrared and Laser Engineering, 2024, 53(6): 20240124
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Received: Mar. 15, 2024
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Published Online: Jul. 31, 2024
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