Researching | Research Progress on Oxygen Control Technology During Preparation of Czochralski Single-Crystal Silicon

Bulletin of the Chinese Ceramic Society, Volume. 41, Issue 9, 3259(2022)

Research Progress on Oxygen Control Technology During Preparation of Czochralski Single-Crystal Silicon

ZHANG Mengyu1...2,*, LI Tai1,2, DU Shanlin1,2, HUANG Zhenling1,2, ZHAO Liang1,2, LYU Guoqiang1,2, and MA Wenhui12 |Show fewer author(s)

Author Affiliations

¹[in Chinese]

²[in Chinese]

show less

Abstract Get PDF(in Chinese)

Figures&Tables (0)

References (52)

Paper Information

Figures & Tables(0)

Tools

Get Citation

Copy Citation Text

ZHANG Mengyu, LI Tai, DU Shanlin, HUANG Zhenling, ZHAO Liang, LYU Guoqiang, MA Wenhui. Research Progress on Oxygen Control Technology During Preparation of Czochralski Single-Crystal Silicon[J]. Bulletin of the Chinese Ceramic Society, 2022, 41(9): 3259

Download Citation

EndNote(RIS)BibTex Plain Text

Set citation alerts for article

Save article for my favorites

Paper Information

Category:

Received: Apr. 22, 2022

Accepted: --

Published Online: Oct. 16, 2022

The Author Email: Mengyu ZHANG (1401637088@qq.com)

DOI:

Topics

laser devices and laser physics

Lasers and Laser Optics

laser manufacturing

Instrumentation, Measurement and Metrology