[1] [1] F. Villa, A. Martínez, L. E. Regalado. Correction masks for thickness uniformity in large-area thin films［J］. Appl. Opt., 2000, 39(10): 1602～1610

[2] [2] J. B. Oliver, D. Talbot. Optimization of deposition uniformity for large-aperture National Ignition Facility substrates in a planetary rotation system［J］. Appl. Opt., 2006, 45(13): 3097～3105

[3] [3] P. Kelkar, B. Tirri, R. Wilklow et al.. Deposition and characterization of challenging DUV coatings［C］. SPIE, 2008, 7067: 706708

[4] [4] B. Sassolas, R. Flaminio, J. Franc et al.. Masking technique for coating thickness control on large and strongly curved aspherical optics［J］. Appl. Opt., 2009, 48(19): 3760～3765

[5] [5] Fang Ming, Fan Zhengxiu, Huang Jianbing. Numerical simulation of a flat planetary fixture for physical vapor deposition［J］. Chinese J. Computational Physics, 2006, 23(6): 738～742

[6] [6] Fang Ming, Zheng Weijun, Wu Ming et al.. Improved design of uniformity mask for flat planetary fixture［J］. J. Vacuum Science and Technology, 2006, 26(4): 286～289

[7] [7] Pan Dongliang, Xiong Shengming, Zhang Yundong et al.. Film uniformity calculation of large caliber coating machine［J］. High Power Laser and Particle Beams, 2000, 12(3): 277～280

[8] [8] F. Villa, O. Pompa. Emission pattern of a real vapor sources in high vacuum: an overview［J］. Appl. Opt., 1999, 38(4): 695～703

[9] [9] G. I. Abzalova, R. S. Sabirov, A. V. Mikhalov. Depositing uniform-thickness coatings on large surfaces by means of electron-beam evaporation in vacuum［J］. J. Opt. Technol., 2005, 72(10): 799～801

[10] [10] F. L. Wang, R. Crocker, R. Faber. Large-area uniformity in evaporation coating through a new form of substrate motion［C］. Tucson: Optical Interference Coating, 2010. 1～3

[11] [11] M. Gross, S. Dligatctch, A. Chtanov. Optimization of coating uniformity in an ion beam sputtering system using a modified planetary rotation method［J］. Appl. Opt., 2011, 50(9): C316～C320