Fig. 1. Schematic of the IBS and ALD equipments

Fig. 2. Test benches for LIDT

Fig. 3. Dispersion of HfO₂ films deposited by different techniques

Fig. 4. 0% LIDT of different HfO₂ films

Fig. 5. Laser damage probabilities of different HfO₂ films

Fig. 6. The laser damage probability of 500 ℃ annealed ALD HfO₂ film irradiated by 10 pulses and 10 000 pulses

Fig. 7. Laser damage morphologies

Fig. 8. Impact of defect on the local temperature in the defect-induced laser damage model