Journal of Applied Optics, Volume. 40, Issue 5, 876(2019)

Design and tolerance analysis of converging lens in immersion lithography illumination system

LI Meixuan1,2、* and DONG Lianhe3
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    References(16)

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    [6] [6] SONG Qiang, ZHU Jing, WANG Jian. A mixed gradient algorithm for high performance DOE designin off-axis lithography illumination system[J].Acta Optica Sinica, 2015, 35(1): 0122005.

    [7] [7] HU Zhonghua, YANG Baoxi, ZHU Jing. Design of diffractive optical element for pupil shaping optics in projection lithography system[J]. Chinese J. Lasers, 2013, 40(6): 0616001.

    [11] [11] CHILDERS J E, BAKER T, EMIG T, et al.Advanced testing requirements of diffractive optical elements for off axis illumination in photolithography[J].SPIE, 2009, 7430: 74300S.

    [12] [12] LI Meixuan, WANG Meijiao, et al.Design and tolerance analysis of compound eye lens in lithography lighting system[J]. Laser & Infrared, 2017, 47(7): 842-847.

    [13] [13] HAO Yong, LI Lun, YU Junbo. Design and preparation of aspherical compound eye[J]. Laser & Infrared, 2016, 46(6): 727-730.

    [14] [14] HAO Yongping, LI Lun. New progress in structure design and imaging systems of artificial compound eye [J]. Laser & Infrared, 2015, 45(12): 1407-1412.

    [15] [15] ZHANG L, LIU D, SHI T, et al. Practical and accurate method for aspheric misalignment aberrations calibration in non-nullinterferometric testing[J]. Applied Opitcs, 2013, 52(35): 8501-8511.

    [16] [16] PFEFFER M M. Aspheric optics from design to manufacturing and aspheric metrology[J].Adv. Opt.Techn., 2016, 5(3): 199-200.

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    LI Meixuan, DONG Lianhe. Design and tolerance analysis of converging lens in immersion lithography illumination system[J]. Journal of Applied Optics, 2019, 40(5): 876

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    Paper Information

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    Received: Mar. 6, 2019

    Accepted: --

    Published Online: Nov. 5, 2019

    The Author Email: Meixuan LI (limx@jlenu.edu.cn)

    DOI:10.5768/jao201940.0505003

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