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Journal of Applied Optics, Volume. 40, Issue 5, 876(2019)

Design and tolerance analysis of converging lens in immersion lithography illumination system

LI Meixuan1,2、* and DONG Lianhe3
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  • 1[in Chinese]
  • 2[in Chinese]
  • 3[in Chinese]
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    LI Meixuan, DONG Lianhe. Design and tolerance analysis of converging lens in immersion lithography illumination system[J]. Journal of Applied Optics, 2019, 40(5): 876

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    Received: Mar. 6, 2019

    Accepted: --

    Published Online: Nov. 5, 2019

    The Author Email: Meixuan LI (limx@jlenu.edu.cn)

    DOI:10.5768/jao201940.0505003

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology